新型半导体显示产业厂房贯通式 洁净室群压力控制创新与工程验证
Innovation and engineering verification of pressure control for a through-cleanroom cluster in a new-type semiconductor display industry factory building
摘要：
对新型半导体显示产业贯通式洁净室群压力调控系统开展了研究,指出了传统调控系统存在的压力波动恢复慢、参数调节滞后、洁净度下降及能耗高等一系列问题,提出了一种基于压力动态补偿的调控系统。分析表明,基于压力动态补偿的调控系统极大提升了室内环境参数精准控制的可靠性和安全性,且在调控过程中,减少了新风需求量,显著降低了运行能耗。以重庆某工程为案例进行了验证,结果表明,新型压力动态补偿系统能够使压差超调量控制在±1 Pa/h 以内,且各项环境参数均达到了NEBB(美国国家环境平衡局)标准。
Abstract：
This paper conducts a study on the pressure control system of a through-cleanroom cluster for the new-type semiconductor display industry, points out a series of problems in traditional control systems, such as slow pressure fluctuation recovery, parameter adjustment lag, decreased cleanliness, and high energy consumption, and proposes a control system based on pressure dynamic compensation. The analysis results show that the control system based on pressure dynamic compensation greatly enhances the reliability and safety of precise control of indoor environmental parameters, and during the control process, it reduces the demand for outdoor air, significantly lowering operation energy consumption. Taking a project in Chongqing as a case study for verification, the results show that the new-type pressure dynamic compensation system can control the differential pressure overshoot within the range of ±1 Pa/h, and all environmental parameters meet NEBB (National Environmental Balancing Bureau, USA) standards.
Keywords:semiconductor; through-cleanroom cluster; pressure dynamic compensation; parameter control; reliability; safety; operation energy consumption