Gaseous chemical contaminant test and pollutant source analysis of semiconductor wafer clean-rooms

Taking the test results of gaseous chemical contaminants in a newly built semiconductor wafer clean-room in China as an example, adopts the method of combining long-term online detection with field measurement to analyse the change of indoor pollution and environmental control effect before and after installing a chemical filter and during the span between building and running the clean-room. Compares with the outdoor air environment and the different types of contaminants before and after operation, and determines the source information of different gaseous chemical contaminants in the clean-room. Finds that the actual removal efficiency of the chemical filter of the outdoor air unit is only 50%, which can not meet the requirement of 70% in the specification. The acid contaminants in the microelectronic clean-room mainly come from the outdoor air, while the ammonia gas comes from the outdoor air and building materials, such as cement. The pollution source of condensate is mainly indoor source, from indoor decoration materials, cleaning agents and production process materials.